| Info. | Vol.4 - No.3 (2010.09.20) |
|---|---|
| Title | Fabrications of a continuous-flow DNA amplifier using dry film resist |
| Authors | Dae Young Kong1 , Tae Wook Kang1 , Chang Taeg Seo1 , Chan Seob Cho2 & Jong Hyun Lee1 |
| Institutions | 1Department of Electronics, Kyungpook National University,
Daegu, Korea 2School of Electrical Engineering, Kyungpook National University, Sangju, Korea Correspondence and requests for materials should be addressed to J.H. Lee (free4939@hanmail.net) |
| Abstract | out any etching. Also, DFR is confirmed low consumption power because DFR has very lower thermal conductivity (2.33 W/mK) in comparison with silicon (168 W/mK) therefore displays high performance in heating an internal sample. As DFR is hydrophilic, it can bond with glasses without any treatment. Therefore, anodic bonding process using silicon bulk micro-machining or an RIE process used in the PDMS fabrication technique using O2 plasma is not necessary. According to these advantages, it is expected that production cost can be decreased because fabrication costs of the PCR chamber is decreased. In this paper, a soda-lime glass substrate coated with a DFR of the fluid to cycle through different temperature zones was used to form a micro-channel structure and integrated Pt heater continuous-flow PCR. |
| Keyword | DNA, Dry film resist, PCR-chip, Amplifier, MEMS |
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