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Info. Vol.14 - No.4 (2020.12.20)
Title Tradeoff Control of Multi-exposure Lithography for SU-8 Photochemical Reaction Channel Formation
Authors Qi-Ming Chen, Jin-Yun Zhou*, Yi-Ming Hu & Qi Zheng
Institutions "School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou 510006, People’s Republic of China
*Correspondence and requests for materials should be addressed to J.Y. Zhou (zhjy@gdut.edu.cn)"
Abstract A method involving multi-exposure with low-power is presented to fabricate an SU-8 mold based on a digital micromirror device (DMD) maskless lithography with an LED source at a wavelength of 405 nm. The SU-8 mold is used for the fabrication of a PDMS concentration gradient generator (CGG). During a one-time exposure, it is easy to over-expose at the top and under-expose at the bottom of a thick SU-8, which then forms a T-shaped structure. This is more obvious for high-absorption coefficients such as 365 nm. We found that by taking advantage of the partially absorbed and partially transmissive characteristics of the 405-nm wavelength, multi-exposure can form an effective photochemical reaction channel in SU-8 and can solve the problem mentioned above. However, excessive exposure will cause the linewidth to increase, therefore, it is necessary to find a tradeoff for the number of multi-exposure times. For a 55-μm thick SU-8, the tradeoff threshold is found to be 25. Three types of SU-8 CGG molds were fabricated at this threshold. The results indicate that the actual profile of the SU-8 mold shows good agreement with the design profile without any T-shaped structures.
Keyword Tradeoff control, Multi-exposure, Lithography, Photochemical reaction channel, SU-8
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